News Article
Air Products And Chemicals Electronics Division`s Schumacher Unit Is To
Air Products and Chemicals Electronics Division's Schumacher unit is to
serve as global master distributor of three new liquid chemical vapour
deposition (CVD) precursors from Dow Corning (Z4MS, ZTOMCATS and Z2DM). The
new products are multifunctional silicon source liquids specifically
designed for thin film dielectric deposition processes for passivation, etch
stop, hard mask and copper diffusion barrier films. The new alliance builds
on an agreement between the companies under which Air Products serves as the
worldwide master distributor of Dow Corning's Z3MS CVD precursor
(trimethylsilane), which is used instead of silane or tetraethyl
orthosilicate-based CVD materials.
Silicon-on-insulator (SOI) wafer supplier Soitec has ordered Applied
Materials' 300mm Reflexion CMP (chemical mechanical polishing) tool. The
Reflexion system is Soitec's first 300mm system. It joins several Applied
Materials Mirra CMP systems used for smaller wafer sizes.
Veeco-Applied Epi has shipped a gas-source GEN III molecular beam epitaxy
(MBE) system to OEpic, a manufacturer of optoelectronic integrated circuits
(OEICs) in Sunnyvale CA. The gas-source GEN III system uses arsine (AH3) and
phosphine (PH3) for group V materials delivery on 1x100mm or 3x50mm wafers.
Materials' 300mm Reflexion CMP (chemical mechanical polishing) tool. The
Reflexion system is Soitec's first 300mm system. It joins several Applied
Materials Mirra CMP systems used for smaller wafer sizes.
Veeco-Applied Epi has shipped a gas-source GEN III molecular beam epitaxy
(MBE) system to OEpic, a manufacturer of optoelectronic integrated circuits
(OEICs) in Sunnyvale CA. The gas-source GEN III system uses arsine (AH3) and
phosphine (PH3) for group V materials delivery on 1x100mm or 3x50mm wafers.
